Author:
Chen Guojin,Yu Ziyang,Liu Hongduo,Ma Yuzhe,Yu Bei
Cited by
10 articles.
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2. An Adversarial Active Sampling-Based Data Augmentation Framework for AI-Assisted Lithography Modeling;2023 IEEE/ACM International Conference on Computer Aided Design (ICCAD);2023-10-28
3. CTM-SRAF: Continuous Transmission Mask-Based Constraint-Aware Subresolution Assist Feature Generation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-10
4. Machine Learning in EDA: When and How;2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD);2023-09-10
5. Efficient ILT via Multi-level Lithography Simulation;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09