The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes-Reference-Cited by-同舟云学术

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The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes

Published:2020-06 Issue:6 Volume:68 Page:2067-2079
ISSN:0018-9480
Container-title:IEEE Transactions on Microwave Theory and Techniques
language:
Short-container-title:IEEE Trans. Microwave Theory Techn.

Author:

Pohle Dennis^ORCID,Schulz Christian,Oberberg Moritz^ORCID,Awakowicz Peter,Rolfes Ilona^ORCID

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Radiation

Link

http://xplorestaging.ieee.org/ielx7/22/9108315/09057528.pdf?arnumber=9057528

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Method for Diagnosing the Process Chamber Prior to Plasma Processes;2023 Asia-Pacific Microwave Conference (APMC);2023-12-05

2. Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma;Applied Science and Convergence Technology;2023-09-12

3. Plasma state supervision utilizing millimeter wave radar systems;International Journal of Microwave and Wireless Technologies;2023-03-30

4. Kinetic investigation of the planar multipole resonance probe under arbitrary pressure;Plasma Sources Science and Technology;2022-10-01

5. Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics;Sensors;2022-07-22

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