Investigation of Plasma Etching Rates of a Methacrylate Resin-Reference-Cited by-同舟云学术

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Investigation of Plasma Etching Rates of a Methacrylate Resin

Published:2022-05-11 Issue: Volume: Page:
ISSN:
Container-title:2022 45th International Spring Seminar on Electronics Technology (ISSE)
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Author:

Borok Alexandra¹,Gal David¹,Kovacs Rebeka¹,Szokol Agnes Nagyne²,Bonyar Attila¹

Affiliation:

1. Budapest University of Technology and Economics,Faculty of Electrical Engineering and Informatics,Department of Electronics Technology,Budapest,Hungary

2. Institute for Solid State Physics and Optics, Wigner Research Centre for Physics of the Hungarian Academy of Sciences,Budapest,Hungary

Funder

Innovation Fund

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9812704/9812706/09812707.pdf?arnumber=9812707

Reference6 articles.

1. Plasma Etching;chung;Encyclopedia of Microfluidics and Nanofluidics,0

2. Optimization of Plasmonic Gold Nanoparticle Concentration in Green LED Light Active Dental Photopolymer

3. Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

4. Surface preparation techniques for biomedical applications

5. Change of properties during storage of a UDMA/TEGDMA dental resin

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