Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process-Reference-Cited by-同舟云学术

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Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process

Published:2016-03 Issue: Volume: Page:
ISSN:
Container-title:2016 China Semiconductor Technology International Conference (CSTIC)
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Author:

Chen Quan,Mao Zhibiao,Yu Shirui,Wu Weiwei

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/7458471/7463893/07463974.pdf?arnumber=7463974

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of Genetic Algorithm to Solving Better SRAF Rules;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

2. Process window analysis of post OPC SRAF placement;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

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