Author:
Yong Huang ,Jialei Liu ,Zhiyong Yang ,Jing Zhao ,Huanxin Liu
Cited by
2 articles.
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1. Study on Process Improvement and Yield Enhancement of 40Nm E-Flash AIO Wet Strip;2022 China Semiconductor Technology International Conference (CSTIC);2022-06-20
2. Impact of Material Interface Geometry on Interconnect Resistance;2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits);2022-06-12