Analysis of Low-Frequency Noise in Quantum Dot/Metal-Oxide Phototransistors With Metal Chalcogenide Interfaces-Reference-Cited by-同舟云学术

Analysis of Low-Frequency Noise in Quantum Dot/Metal-Oxide Phototransistors With Metal Chalcogenide Interfaces

Author:

Kim Jaehyun¹^ORCID,Kim Myung-Gil²,Facchetti Antonio¹,Park Sung Kyu³^ORCID

Affiliation:

1. Department of Chemistry and the Materials Research Center, Northwestern University, Evanston, IL, USA

2. School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, South Korea

3. School of Electrical and Electronics Engineering, Chung-Ang University, Seoul, South Korea

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

Reference24 articles.

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

5. Enhanced Photoresponse of SnS2/Si Nanowire Heterostructure by KOH Etching;2022 IEEE International Conference on Emerging Electronics (ICEE);2022-12-11