Impact of gate workfunction fluctuation on FinFET standard cells
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/7041007/7049902/07050050.pdf?arnumber=7050050
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2. Suppression of Threshold Voltage Variation by TiN Surface Treatment for N-FinFETs With Very Thin Work Function Metal Layers;IEEE Transactions on Electron Devices;2023-04
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4. Using Lyapunov Exponents to Estimate Sensitivity to Process Variability;2023 IEEE 14th Latin America Symposium on Circuits and Systems (LASCAS);2023-02-27
5. Current Behavior on Process Variability Aware FinFET Inverter Designs;2021 IEEE 12th Latin America Symposium on Circuits and System (LASCAS);2021-02-21
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