Negative Bias Temperature Instability in Top-Gated Carbon Nanotube Thin Film Transistors With Y<sub>2</sub>O<sub>3</sub> Gate Dielectric-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Negative Bias Temperature Instability in Top-Gated Carbon Nanotube Thin Film Transistors With Y₂O₃ Gate Dielectric

Published:2023-12 Issue:4 Volume:23 Page:571-576
ISSN:1530-4388
Container-title:IEEE Transactions on Device and Materials Reliability
language:
Short-container-title:IEEE Trans. Device Mater. Relib.

Author:

Wang Yuwei¹^ORCID,Wang Sha²^ORCID,Ye Huaidong³,Zhang Wenhao²^ORCID,Xiang Li²^ORCID

Affiliation:

1. College of Electrical and Information Engineering, Hunan University, Changsha, China

2. College of Materials Science and Engineering, Hunan University, Changsha, China

3. Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan, China

Funder

National Natural Science Foundation of China

Natural Science Foundation of Hunan Province

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Safety, Risk, Reliability and Quality,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/7298/10346019/10272672.pdf?arnumber=10272672

Reference36 articles.

1. Carbon-based electronics

2. Carbon Nanotubes for High-Performance Electronics—Progress and Prospect

3. Ballistic carbon nanotube field-effect transistors

4. Quasi-ballistic carbon nanotube array transistors with current density exceeding Si and GaAs

5. Modern microprocessor built from complementary carbon nanotube transistors

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving Deposition Density of Solution Processed Carbon Nanotubes by Substrate Treatment for High-Performance Flexible Thin Film Transistors;IEEE Electron Device Letters;2024-04

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3