Vertical Vertical β-Ga₂O₃ Power Diodes: From Interface Engineering to Edge Termination

Author:

Wen Junpeng1ORCID,Hao Weibing1,Han Zhao1ORCID,Wu Feihong1,Li Qiuyan1ORCID,Liu Jinyang1,Liu Qi1ORCID,Zhou Xuanze1,Xu Guangwei1ORCID,Yang Shu1ORCID,Long Shibing1ORCID

Affiliation:

1. School of Microelectronics, University of Science and Technology of China (USTC), Hefei, China

Funder

National Natural Science Foundation of China

University of Science and Technology of China (USTC) Research Funds of the Double First-Class Initiative

Collaborative Innovation Program of Hefei Science Center, Chinese Academy of Sciences

JieBang Headed Project of Changsha City Hunan Province

Opening Project of the Key Laboratory of Nanodevices and Applications in Suzhou Institute of Nano-Tech and Nano-Bionics of CAS

Center for Micro and Nanoscale Research and Fabrication, the Information Science Laboratory Center of USTC

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Improved β-Ga2O3 Schottky Barrier Diodes Featuring p-NiO Gradual Junction Termination Extension within Mesa Structure;2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD);2024-06-02

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