In-Depth Analysis of Transistor Influence on OxRAM Performance in Memory Bitcell, With Technology Scaling Perspectives

Author:

Berthaud F.1ORCID,Martin S.1,Rottner J.1,Meli V.1,Nodin J.-F.1,Grenouillet L.1ORCID,Ricavy S.1ORCID,Cassé M.1ORCID,Castellani N.1ORCID

Affiliation:

1. Univ. Grenoble Alpes, CEA, Leti, France

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Reference41 articles.

1. Highly scalable non-volatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses;Baek

2. Super non-linear RRAM with ultra-low power for 3D vertical nano-crossbar arrays;Luo;Nanoscale,2016

3. Fabrication of low-power RRAM for stateful hyperdimensional computing;Dubreuil

4. OxRAM for embedded solutions on advanced node: Scaling perspectives considering statistical reliability and design constraints;Sandrini

5. Experimental Demonstration of Multilevel Resistive Random Access Memory Programming for up to Two Months Stable Neural Networks Inference Accuracy

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