Investigation of NH3 Plasma Nitridation on Hysteresis-Free Gate-All-Around Stacked Poly-Si Nanosheet Channel FeFETs
Author:
Affiliation:
1. National Yang Ming Chiao Tung University,Department of Electrophysics,Hsinchu,Taiwan
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9797886/9797892/09798318.pdf?arnumber=9798318
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