DC Magnetron Sputtering Particle Distribution and Energy Simulation Study
Author:
Affiliation:
1. Xi’an University of Technology,School of Electrical Engineering,Xi’an,China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10139313/10138934/10139580.pdf?arnumber=10139580
Reference12 articles.
1. Magnetic field optimization and high-power discharge characteristics of cylindrical sputtering cathode
2. Effect of gas pressure on ion energy at substrate side of Ag target radiofrequency and very-high-frequency magnetron sputtering discharge;weichen;Plasma Science and Technology,2022
3. Thin film materials technology: sputtering of control compound materials;wasa;Springer Science & Business Media,2004
4. Hybrid Modeling of a Capacitively Coupled Radio Frequency Glow Discharge in Argon: Combined Monte Carlo and Fluid Model
5. Magnetron sputtering – Milestones of 30 years
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