Effect of the nitrous oxide plasma treatment on the MIM capacitor-Reference-Cited by-同舟云学术

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Effect of the nitrous oxide plasma treatment on the MIM capacitor

Published:2002-09 Issue:9 Volume:23 Page:529-531
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Ng C.H.,Chu S.-F.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/55/22109/01028989.pdf?arnumber=1028989

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of electrical properties of hafnium oxide thin film based metal–insulator–metal capacitors: pre and post metallic annealing;Journal of Materials Science: Materials in Electronics;2016-10-07

2. An experimental investigation of alternative propellants for the helicon double layer thruster;Journal of Physics D: Applied Physics;2008-08-21

3. Mechanism of the metal–insulator–metal capacitance drift for advanced mixed-signal copper process device;Journal of Physics and Chemistry of Solids;2008-02

4. Improving Electrical Characteristics of High-kNiTiO Dielectric with Nitrogen Ion Implantation;Japanese Journal of Applied Physics;2006-09-07

5. MIM Capacitor Integration for Mixed-Signal/RF Applications;IEEE Transactions on Electron Devices;2005-07

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