Record 7(N)+7(P) Multiple VTs Demonstration on GAA Si Nanosheet n/pFETs using WFM-Less Direct Interfacial La/Al-Dipole Technique
Author:
Affiliation:
1. Institute of Microelectronics, Chinese Academy of Sciences,Integrated Circuit Advanced Process R&D Center,Beijing,China
Funder
Chinese Academy of Sciences
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10019319/10019320/10019361.pdf?arnumber=10019361
Reference9 articles.
1. Controlling Threshold Voltage of CMOS SOI Nanowire FETs With Sub-1 nm Dipole Layers Formed by Atomic Layer Deposition
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Critical challenges in the development of electronics based on two-dimensional transition metal dichalcogenides;Nature Electronics;2024-07-29
2. Low-temperature atomic-level trimming on Ge interfused surface for gate-all-around Si nanosheets transistors;Rare Metals;2024-07-09
3. A Common Source 3D FeFET with Disturb Inhibition Program and Erase Method;ECS Journal of Solid State Science and Technology;2024-06-03
4. The Drain Bias Modulation Effect of Random Telegraph Noise in Gate-All-Around FETs for Cryogenic Applications;IEEE Electron Device Letters;2024-04
5. Hybrid Integration of Gate-All-Around Stacked Si Nanosheet FET and Si/SiGe Super-Lattice FinFET to Optimize 6T-SRAM for N3 Node and Beyond;IEEE Transactions on Electron Devices;2024-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3