Germanium compatible photoresist strippers and residue cleaners for 5nm and below technology nodes
Author:
Hsu Chien-Pin Sherman
Cited by
1 articles.
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1. Highly Selective Si vs. SiGe and SiGe vs. Ge Wet Etch for Sub 2nm Applications;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13