The Level-Set Method for Multi-Material Wet Etching and Non-Planar Selective Epitaxy-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The Level-Set Method for Multi-Material Wet Etching and Non-Planar Selective Epitaxy

Published:2020 Issue: Volume:8 Page:115406-115422
ISSN:2169-3536
Container-title:IEEE Access
language:
Short-container-title:IEEE Access

Author:

Toifl Alexander^ORCID,Quell Michael^ORCID,Klemenschits Xaver^ORCID,Manstetten Paul^ORCID,Hossinger Andreas^ORCID,Selberherr Siegfried^ORCID,Weinbub Josef^ORCID

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

General Engineering,General Materials Science,General Computer Science

Link

http://xplorestaging.ieee.org/ielx7/6287639/8948470/09122490.pdf?arnumber=9122490

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Modern Formulation of Knudsen Diffusion with Applications to Nanofabrication;2023 IEEE 23rd International Conference on Nanotechnology (NANO);2023-07-02

2. Anisotropic Analysis of Etch Rates for Sapphire Based on a Layer-by-Layer Removal Model of Surface Atoms;Processes;2023-04-21

3. Impact of plasma induced damage on the fabrication of 3D NAND flash memory;Solid-State Electronics;2022-06

4. Curvature based feature detection for hierarchical grid refinement in TCAD topography simulations;Solid-State Electronics;2022-05

5. Analysis of Etch Profiles on C-Plane Wafers in Wet Etching of Sapphire Based on Undercutting Rate Distributions in Mixture of H₂SO₄ and H₃PO₄ at 236 °C;ECS Journal of Solid State Science and Technology;2022-03-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP