Supply Waveform Effect on the Characteristics of RF Capacitively Coupled Plasma in Ar/H2 Mixture
Author:
Affiliation:
1. Laboratoire Génie Electrique et Energies Renouvelables, Chlef University, Chlef, Algeria
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Link
http://xplorestaging.ieee.org/ielx7/27/10492641/10433385.pdf?arnumber=10433385
Reference49 articles.
1. Role of Boundary Wall and Asymmetric Electrodes on Behaviour of Anode Glow in Planar DC Discharge
2. PIC MC Using Free Path for the Simulation of Low-Pressure RF Discharge in Argon
3. Electrical model parameters identification of radiofrequency discharge in argon through 1D3V/PIC-MC model
4. Self-consistent particle modeling of radio frequency discharge in Ar/O2 mixtures: Effects of crossed electric and magnetic fields and partial pressure
5. Particle modelling of low-pressure radio-frequency magnetron discharges including the effects of self-induced electromagnetic fields
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