Sub-Pico-Second Hole Generation Lifetime in Thin Film IGZO Sputtered and Annealed on P-Silicon Substrate-Reference-Cited by-同舟云学术

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Sub-Pico-Second Hole Generation Lifetime in Thin Film IGZO Sputtered and Annealed on P-Silicon Substrate

Published:2021 Issue: Volume:20 Page:392-399
ISSN:1536-125X
Container-title:IEEE Transactions on Nanotechnology
language:
Short-container-title:IEEE Trans. Nanotechnology

Author:

Kishore Rishabh,Vishwakarma Kavita,Datta Arnab^ORCID

Funder

DST, (Nano-mission) Govt. of India

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Science Applications

Link

http://xplorestaging.ieee.org/ielx7/7729/9310738/09423600.pdf?arnumber=9423600

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Persistent photoconductivity in a-IGZO thin films induced by trapped electrons and metastable donors;Journal of Applied Physics;2022-03-28

2. Effect of Non-identical Annealing on the Breakdown Characteristics of Sputtered IGZO Films;2022 IEEE International Reliability Physics Symposium (IRPS);2022-03

3. Impact of Nonuniform Ozone Anneal Treatment on the Resistance Levels in an IGZO-ReRAM Fabricated on ITO-Coated Glass Substrate;IEEE Transactions on Electron Devices;2021-12

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