Using charge self-compensation domino full-adder with multiple supply and dual threshold voltage in 45nm technology-Reference-Cited by-同舟云学术

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Using charge self-compensation domino full-adder with multiple supply and dual threshold voltage in 45nm technology

Published:2009-03 Issue: Volume: Page:
ISSN:
Container-title:2009 10th International Conference on Ultimate Integration of Silicon
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Author:

Jinhui Wang ,Wuchen Wu ,Ligang Hou ,Shuqin Geng ,Wang Zhang ,Xiaohong Peng ,Na Gong

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4832838/4897524/04897577.pdf?arnumber=4897577

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