Nonvolatile-Memory Characteristics of $\hbox{AlO}^{-}$ -Implanted $\hbox{Al}_{2}\hbox{O}

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Nonvolatile-Memory Characteristics of $\hbox{AlO}^{-}$ -Implanted $\hbox{Al}_{2}\hbox{O}_{3}$

Published:2009-08 Issue:8 Volume:30 Page:837-839
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Kim M.C.,Sung Kim ,Suk-Ho Choi ,Belay K.,Elliman R.G.,Russo S.P.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/55/5173587/05159530.pdf?arnumber=5159530

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