Author:
Namavar F.,Cortesi E.,Kalkhoran N.M.,Manke J.M.,Buchanan B.L.
Cited by
12 articles.
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1. Separation of plasma implantation of oxygen to form silicon on insulator;Applied Physics Letters;1997-03-31
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4. Oxygen redistribution during low-energy oxygen implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-04
5. Scaling constraints imposed by self-heating in submicron SOI MOSFET's;IEEE Transactions on Electron Devices;1995-03