Thermal-Neutron SER Mitigation by Cobalt-Contact in 7 nm Bulk-FinFET Technology
Author:
Affiliation:
1. Samsung Electronics, Co., Ltd.,Samsung Foundry,Korea
2. Samsung Electronics, Co., Ltd.,Semiconductor Research and Development Center,Korea
3. Samsung Research and Development Institute Japan,Japan
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9764406/9764408/09764581.pdf?arnumber=9764581
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4. Extreme Contact Scaling with Advanced Metallization of Cobalt
5. Fluorine-free tungsten films as low resistance liners for tungsten fill applications
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