Fullerene based materials for ultra-low-k application-Reference-Cited by-同舟云学术

Fullerene based materials for ultra-low-k application

Published:2010-06 Issue: Volume: Page:
ISSN:
Container-title:2010 International Students and Young Scientists Workshop "Photonics and Microsystems"
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Author:

Broczkowska Katarzyna¹,Klocek Jolanta²,Friedrich Daniel²,Henkel Karsten²,Kolanek Krzysztof²,Urbanowicz Adam³,Schmeisser Dieter²,Miller Miroslaw¹,Zschech Ehrenfried⁴

Affiliation:

1. Wroclaw University of Technology, Faculty of Chemistry, Poland

2. Brandenburg University of Technology, Chair Applied Physic and Sensors, Cottbus, Germany

3. Interuniversity Microelectronic Center (IMEC), 3001, Leuven, Belgium

4. Fraunhofer Institute for Non-Destructive Testing Dresden branch (IZFP-D), Germany

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/5710232/5714156/05714165.pdf?arnumber=5714165

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