Process Modeling as a Powerful Semiconductor Industry Tool: PVD of W as Case Study
Author:
Affiliation:
1. Applied Materials India Pvt. Ltd,Bengaluru,India
2. Applied Materials Inc.,Santa Clara,CA,USA
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10117590/10117577/10117770.pdf?arnumber=10117770
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3. Integrated multi-scale model for ionized plasma physical vapor deposition
4. Monte carlo and kinetic monte carlo models for deposition processes: a review of recent works;nikolaos;Frontiers in Physics,2021
5. Estimation of tungsten production from the upper divertor in EAST during edge localized modes;jing;Chinese Physics B,2019
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