Integrated multi-scale model for ionized plasma physical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1371279
Reference16 articles.
1. A unified line-of-sight model of deposition in rectangular trenches
2. Modeling bias sputter planarization of metal films using a ballistic deposition simulation
3. Thin film microstructure modelling through line-segment simulation
4. Monte Carlo simulations of sputter deposition and step coverage of thin films
5. Liner conformality in ionized magnetron sputter metal deposition processes
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