Improved MW of IGZO-channel FeFET by Reading Scheme Optimization and Interfacial Engineering
Author:
Affiliation:
1. imec,Leuven,Belgium,3001
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10145914/10145815/10145930.pdf?arnumber=10145930
Reference20 articles.
1. Logic Compatible High-Performance Ferroelectric Transistor Memory
2. Electrical Investigation of Wake-Up in High Endurance Fatigue-Free La and Y Doped HZO Metal–Ferroelectric–Metal Capacitors
3. Ferroelectricity in Simple Binary ZrO2 and HfO2
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1. A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs;IEEE Electron Device Letters;2024-08
2. High-Performance Ferroelectric Thin Film Transistors with Large Memory Window Using Epitaxial Yttrium-Doped Hafnium Zirconium Gate Oxide;ACS Applied Materials & Interfaces;2024-04-02
3. Ultrathin TIO2 Channel HfLaO FeFET with Low Operation Voltage;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
4. New Insight into Impacts from Read Cycle Number and Voltage Sweeping Direction on Memory Window of Ferroelectric Fet;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
5. Improvement in the polarization properties in thin ferroelectric Hf0.5Zr0.5O2 films by two-step flash lamp annealing;Japanese Journal of Applied Physics;2024-02-01
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