Use of Neural Network to Characterize a Low Pressure Temperature Effect on Refractive Property of Silicon Nitride Film Deposited by PECVD
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Condensed Matter Physics,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx5/27/28766/01291607.pdf?arnumber=1291607
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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