Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies-Reference-Cited by-同舟云学术

Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies

Published:2021-03 Issue: Volume: Page:
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Container-title:2021 IEEE International Reliability Physics Symposium (IRPS)
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Author:

Rzepa G.,Karner M.,Baumgartner O.,Strof G.,Schanovsky F.,Mitterbauer F.,Kernstock C.,Karner H.W.,Weckx P.,Hellings G.,Claes D.,Wu Z.,Xiang Y.,Chiarella T.,Parvais B.,Mitard J.,Franco J.,Kaczer B.,Linten D.,Stanojevic Z.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9405068/9405088/09405172.pdf?arnumber=9405172

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