Analysis of Low-Dropout Voltage Regulator designed with Gate-All-Around nanosheet transistors
Author:
Affiliation:
1. University of Sao Paulo,LSI/PSI/USP,Sao Paulo,Brazil
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10302454/10302463/10302596.pdf?arnumber=10302596
Reference12 articles.
1. Nanowire TFET with different Source Compositions applied to Low-Dropout Voltage Regulator
2. Design of operational transconductance amplifier with Gate-All-Around Nanosheet MOSFET using experimental data from room temperature to 200 °C
3. Analysis and design of monolithic, high PSR, linear regulators for SoC applications
4. Gate-All-Around Nanowire FETs vs. Triple-Gate FinFETs: On Gate Integrity and Device Characteristics;veloso;2016 ECS Trans 72 85 Imec Kapeldreef 75,2016
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