Demonstration of an 1200V/20A 4H-SiC Multi-Step Trenched Junction Barrier Schottky Diode
Author:
Affiliation:
1. Hubei Jiufengshan Laboratory,Dept of Integrated Power Systems and Device Technology,WUHAN,China,430206
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10070854/10070925/10071062.pdf?arnumber=10071062
Reference9 articles.
1. Optimized Design of 4H-SiC Multi-Trenched Junction Barrier Schottky Diodes;yuan;12th National Semiconductor Discrete Device Annual Conference,2018
2. Advanced Power Rectifier Concepts
3. 4H-SiC Trench Structure Schottky Diodes
4. Annealing induced extended defects in as-grown and ion-implanted 4H–SiC epitaxial layers
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