Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 4.Laser Produced Plasma Light Sources 4.1Present Status of Laser Produced Plasma EUV Sources Development-Reference-Cited by-同舟云学术

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Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 4.Laser Produced Plasma Light Sources 4.1Present Status of Laser Produced Plasma EUV Sources Development

Published:2003 Issue:3 Volume:79 Page:234-239
ISSN:0918-7928
Container-title:Journal of Plasma and Fusion Research
language:en
Short-container-title:J. Plasma Fusion Res.

Author:

TOMIE Toshihisa¹

Affiliation:

1. Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Link

https://www.jstage.jst.go.jp/article/jspf/79/3/79_3_234/_pdf

Reference14 articles.

1. [2] T. Tomie et al., 2nd Int. Workshop on EUV Lithography (October 2000, San Francisco) Oral 6.

2. [3] T. Tomie et al., 3rd Int. Workshop on EUV Lithography (October 2001, Matsue) Oral 2-6.

3. [4] E.Parra et al.,1st Int. Symposium on EUV Lithography (October 2002, Dallas) Poster 44.

4. [5] W.P. Ballard et al.,3rd Int. Workshop on EUV Lithography (October 2001, Matsue) Oral 2-1.

5. [6] W.P. Ballard et al., 1st Int. Symposium on EUV Lithography (October 2002, Dallas) Oral 132.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme Ultraviolet (EUV) Radiation from Punched-Out Target;The Review of Laser Engineering;2008

2. Characterization of Pulsed High-Current Generator for Extreme Ultraviolet Generation;IEEJ Transactions on Fundamentals and Materials;2007

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