Characterization of Pulsed High-Current Generator for Extreme Ultraviolet Generation
Author:
Affiliation:
1. Extreme Energy-Density Research Institute, Nagaoka University of Technology
2. Nichicon Corporation
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
http://www.jstage.jst.go.jp/article/ieejfms/127/3/127_3_151/_pdf
Reference12 articles.
1. Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
2. Laser-produced plasma (LPP) scale-up and commercialization
3. (3) W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T. Melnychuk, and J. E. Rauch : “Progress Toward use of a Dense Plasma Focus as a Light Source for Production EUV Lithography”, Proc. of SPIE, Vol. 4343 (2001)
4. (4) International Technology Roadmap for Semiconductor Web Site, update 2004, http://public.itrs.net/
5. Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 4.Laser Produced Plasma Light Sources 4.1Present Status of Laser Produced Plasma EUV Sources Development
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