Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources-Reference-Cited by-同舟云学术

Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources

Published:2011 Issue: Volume:6 Page:2401145-2401145
ISSN:1880-6821
Container-title:Plasma and Fusion Research
language:en
Short-container-title:Plasma and Fusion Research

Author:

SASAKI Akira¹,NISHIHARA Katsunobu²,SUNAHARA Atsushi³,FURUKAWA Hiroyuki³,NISHIKAWA Takeshi⁴,KOIKE Fumihiro⁵

Affiliation:

1. Quantum Beam Science Directorate, Japan Atomic Energy Agency, Kizugawa 619-0215, Japan

2. Institute of Laser Engineering, Osaka University, Suita 565-0871, Japan

3. Institute for Laser Technology, Osaka 550-0004, Japan

4. Department of Electrical and Electronic Engineering, Okayama University, Okayama 700-8530, Japan

5. Physics Laboratory, School of Medicine, Kitasato University, Sagamihara 228-8555, Japan

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Subject

Condensed Matter Physics

Link

http://www.jstage.jst.go.jp/article/pfr/6/0/6_0_2401145/_pdf

Reference12 articles.

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2. [2] I.V. Fomenkov, A.I. Erashov, W.N. Partlo, D.W. Myers, R.L. Sandstrom, N.R. Böwering, G.O. Vaschenko, O.V. Khodykin, A.N. Bykanov, S.N. Strivastava, I. Ahmad, C. Rajyagur, D.J. Golich, S. De Dea, R.R. Hou, K.M. O'Brien, W.J. Dunstan and D.C. Brandt, Proc. SPIE 7636, 763639 (2010).

3. Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm

4. [4] S.S. Churilov, R.R. Kildiyarova, A.N. Ryabtsev and S.V. Sadovsky, Phys. Scr. 80, 045303 (2009).

5. Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source