Author:
Kuprin A.S.,Leonov S.A.,Ovcharenko V.D.,Reshetnyak E.N.,Belous V.A.,Vasilenko R.L.,Tolmachova G.N.,Kovalenko V.I.,Klimenko I.O.
Abstract
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated.
Publisher
Problems of Atomic Science and Technology
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