Study of Titanium-doped Silicon Films Prepared by Magnetron Sputtering and Nanosecond Pulsed Laser-Reference-Cited by-同舟云学术

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Study of Titanium-doped Silicon Films Prepared by Magnetron Sputtering and Nanosecond Pulsed Laser

Published:2018 Issue:9 Volume:47 Page:916005
ISSN:1004-4213
Container-title:ACTA PHOTONICA SINICA
language:en
Short-container-title:光子学报

Author:

WANG Kai 王凯,LI Xiao-hong 李晓红,ZHANG Yan-bing 张延彬,WEN Cai 温才,LIU De-xiong 刘德雄

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Atomic and Molecular Physics, and Optics

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Au-Hyperdoped Si Nanolayer: Laser Processing Techniques and Corresponding Material Properties;Materials;2023-06-16

2. Hyperdoped silicon: Processing, properties, and devices;Journal of Semiconductors;2022-09-01

3. Hyperdoping of silicon films with titanium via nanosecond-laser melting: Structure evolution, impurity distribution, sub-bandgap formation, and doping mechanism;Optics & Laser Technology;2022-03

4. Negative photoconductivity in sulfur-hyperdoped silicon film;Materials Science in Semiconductor Processing;2019-08

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