Author:
Yang Xinhua 杨欣华,Jiang Yipeng 江一鹏,Li Sikun 李思坤,Liao Lufeng 廖陆峰,Zhang Shuang 张双,Zhang Libin 张利斌,Zhang Shengrui 张生睿,Shi Weijie 施伟杰,Wei Yayi 韦亚一,Wang Xiangzhao 王向朝
Publisher
Shanghai Institute of Optics and Fine Mechanics
Reference30 articles.
1. Semiconductor manufacturing technology;M Quirk,2001
2. 半导体先进光刻理论与技术;安德里亚斯·爱德曼,2023
3. Optical and EUV lithography: a modeling perspective;A Erdmann,2023
4. Novel OPC flow for the trim-mask lithography;Y Kojima;Proceedings of SPIE,2012
5. Optimization of stepper parameters and their influence on OPC;E Barouch;Proceedings of SPIE,1996