In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images-Reference-Cited by-同舟云学术

In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images

Published:2012 Issue:12 Volume:10 Page:121202-121205
ISSN:1671-7694
Container-title:Chinese Optics Letters
language:en
Short-container-title:中国光学快报

Author:

Dongbo Xu Dongbo Xu,Xiangzhao Wang Xiangzhao Wang,Yang Bu Yang Bu,Lifeng Duan Lifeng Duan,Guanyong Yan Guanyong Yan,Jishuo Yang Jishuo Yang,Anatoly Y. Burov Anatoly Y. Burov

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comprehensive and quantitative characterization and analysis method of 3D mask effect for lithography simulation;10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies;2021-12-13

2. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix;Optics Communications;2019-01

3. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations;Acta Optica Sinica;2018

4. The Spectral Prediction of Original Primary Pigment Based on Constrained Non-Negative Matrix Factorization;SPECTROSC SPECT ANAL;2016

5. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13