Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography
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Published:2012
Issue:12
Volume:32
Page:1211003
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ISSN:0253-2239
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Container-title:Acta Optica Sinica
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language:en
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Short-container-title:光学学报
Author:
Wang Jun 王君,Jin Chunshui 金春水,Wang Liping 王丽萍,Lu Zengxiong 卢增雄
Publisher
Shanghai Institute of Optics and Fine Mechanics
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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