Structural and Electronic Properties of a Thin Metal-Silicide Film on Silicon Surface: A First-Principles Study
Author:
Affiliation:
1. Institute for Basic Science, Department of Physics, Chungbuk National University, Cheongju, 361-763, South Korea
Abstract
Publisher
World Scientific Pub Co Pte Lt
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://www.worldscientific.com/doi/pdf/10.1142/S0218625X03005128
Reference18 articles.
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3. The growth of CoSi2 through an oxide layer: dependence on Si(100) surface structure
4. Density functional study of the initial stage of the anneal of a thin Co film on Si
5. Low temperature ion beam synthesis of NiSi2 layers with fine electrical property
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1. Chemisorption of silyl radicals onto Pd(100) surface: A computational DFT study;Surface Science;2007-01
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