CHEMICAL AND STRUCTURAL CHARACTERIZATION OF Co–Ni SILICIDE THIN FILMS-Reference-Cited by-同舟云学术

CHEMICAL AND STRUCTURAL CHARACTERIZATION OF Co–Ni SILICIDE THIN FILMS

Published:2002-10 Issue:05n06 Volume:09 Page:1661-1666
ISSN:0218-625X
Container-title:Surface Review and Letters
language:en
Short-container-title:Surf. Rev. Lett.

Author:

GARCIA-MENDEZ M.¹,ELIZONDO-VILLARREAL N.¹,FARIAS M. H.²,HIRATA G. A.²,BEAMSON G.³

Affiliation:

1. Facultad de Ciencias Fìsico-Matemáticas de la UANL. Manuel L. Barragán S/N, Edif. de Posgrado, Ciudad Universitaria, San Nicolás de los Garza, N.L. 66450, Mexico

2. Centro de Ciencias de la Materia Condensada, UNAM, Apdo. Postal 2681, Ensenada, B.C. 22800, Mexico

3. Daresbury Laboratory, Daresbury, Warrington, Cheshire WA4 4AD, UK

Abstract

By means of pulsed laser deposition we prepared Co–Ni/p-Si thin films upon a Si(100) substrates. Samples were thermally treated in vacuum in order to promote silicide formation. From X-ray photo-electron spectroscopy (XPS) analysis, we detected chemical shifts of the Co2p and Ni2p transitions, characteristic of silicide binding energy, at the respective ranges of 778.3–778.6 and 853.2–853.6 eV. By means of high resolution transmission electron microscopy (HRTEM) we identified some nanocrystalline regions belonging to CoSi 2, Ni 2 Si and NiSi 2 structures. We also appreciate that the resulting films are of a polycrystalline nature.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218625X02004177

Reference19 articles.

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