DOMAIN GROWTH OF THE DAS STRUCTURE ON A QUENCHED Si(111) SURFACE STUDIED BY STM

Author:

SHIMADA WATARU1,TOCHIHARA HIROSHI1,SATO TOMOSHIGE2,IWATSUKI MASASHI2

Affiliation:

1. Department of Molecular and Material Sciences, Kyushu University, Kasuga 816-8580, Japan

2. JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan

Abstract

We continuously observed the growth of the dimer–adatom–stacking-fault (DAS) domain, in unreconstructed regions remaining after quenching a Si(111) surface to 370–380°C, by using scanning tunneling microscopy. It was observed that a single faulted (F) half of the 9×9 unit cell of the DAS structure grows to a small 9×9 DAS domain. Continuous measurements showed that new F-halves are created sharing corner holes with existing F-halves. The creation of new isolated F-halves was very seldom at 370–380°C, and the region of the DAS structure was grown by expanding the area of the existing DAS domains.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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