CREATION OF A 3D STRUCTURE BASED ON THE HIGH STRENGTH METALLURGICAL GRAPHENE®

Abstract

Herein, the results of a study focused on graphene in activation and cross-linking reactions with hydrazine are reported. The method provides an approach to the preparation of graphene-based materials, in this case, with a preset distance between individual layer and a relatively low ratio between the Raman [Formula: see text] and [Formula: see text] bands — [Formula: see text] peak intensity/[Formula: see text] peak intensity ([Formula: see text]/[Formula: see text]), ca. 1.81 (for unmodified High Strength Metallurgical Graphene[Formula: see text] (HSMG[Formula: see text] [Trade mark number: 013391669; Office for Harmonization in the Internal Market]), this ratio is 0.16). A 3D structure was created without a substrate (e.g. Si, SiO2 or polymer). This method allows for the preparation of a 3D graphene structure without the [Formula: see text]–[Formula: see text] interactions between individual layers.