Affiliation:
1. IHP, im Technologiepark 25, 15236 Frankfurt (Oder), Germany
Abstract
This work reports on the development of SiGe-BiCMOS technologies for mm-wave and THz high frequency applications. We present state-of-the-art performances for different SiGe heterojunction bipolar transistor (SiGe-HBT) developments as well as the evolution of complex BiCMOS technologies. With respect to different technology generations of high-speed SiGe-BiCMOS processes at IHP we discuss selected device modifications of the SiGe-HBT to achieve high frequency performances of a complex BiCMOS technology towards the 0.5 THz regime. We show the difference of high-frequency performance difference with respect to maximum achievable transit frequencies fT and oscillation frequencies fmax in comparison to RF-CMOS technologies and depict the required increase of additional process effort for the HBT-module integration for a 0.5 THz SiGe-BiCMOS technology. Moreover different high speed circuits are presented like broadband ICs for optical communication, high frequency circuits for wireless communication at 60 and 240 GHz, mm-wave radar circuits at 60 and 120 GHz as well as THz circuits operating at 245 GHz and 500 GHz for spectroscopic applications. All reviewed circuit examples are based on the discussed 130nm-SiGe-BiCMOS technologies and show their potential for a broad range of high-speed applications.
Publisher
World Scientific Pub Co Pte Lt
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献