DEPOSITION OF CHROMIUM-CARBON FILMS BY MAGNETRON SPUTTERING OF CHROMIUM AND CARBON TARGETS

Abstract

Chromium-carbon films have been deposited on silicon substrates by magnetron sputtering of chromium and carbon targets in pure argon atmosphere. The composition of the films was examined by Auger electron spectroscopy. Oxygen, nitrogen, and iron were the major impurities incorporated in the films. The mechanical and electrical properties of the films were investigated as a function of negative bias voltage applied to substrates. The hardness and elastic modulus were measured by a nano-indenter and the values are around 17.0±0.9 GPa and 245±11 GPa , respectively. The hardness and elastic modulus of the films increased while the electrical resistivity decreased when the substrate bias voltage was applied. The lowest resistivity (~ 267 μ ohm-cm ) was obtained at the substrate bias voltage of 50 V. The temperature dependence of resistivity of the films was measured in air from room temperature to 673 K. The time dependence of resistivity of the films was also measured in air at 673 K. It was found that the resistivity changed little with temperature or time.