PHYSICAL AND CHEMICAL NANOLITHOGRAPHY TECHNIQUES: CHALLENGES AND PROSPECTS

Abstract

The fabrication of nanodevices and nanosystems having dimensions smaller than 100 nm requires the ability to produce, control, manipulate, and modify structures at the nanometer scale. Physical and chemical nanolithography techniques have been demonstrated to be promising because of the low cost and high throughput. Although the physical and chemical nanolithography techniques can pattern small features on single chips or across an entire wafer, there are considerable challenges when dealing with complex nanostructures, alignment and multilevel stacks. In this paper, the problems are reviewed and potential solutions suggested.