EXCITATION WAVELENGTH DEPENDENCE OF LASER ABLATION MECHANISM OF URETHANE–UREA COPOLYMER FILM STUDIED BY NANOSECOND TIME-RESOLVED INTERFEROMETRY-Reference-Cited by-同舟云学术

EXCITATION WAVELENGTH DEPENDENCE OF LASER ABLATION MECHANISM OF URETHANE–UREA COPOLYMER FILM STUDIED BY NANOSECOND TIME-RESOLVED INTERFEROMETRY

Published:2004-12 Issue:03n04 Volume:13 Page:373-381
ISSN:0218-8635
Container-title:Journal of Nonlinear Optical Physics & Materials
language:en
Short-container-title:J. Nonlinear Optic. Phys. Mat.

Author:

TADA TAKUJI¹,ASAHI TSUYOSHI¹,TSUCHIMORI MASAAKI²,WATANABE OSAMU²,MASUHARA HIROSHI¹

Affiliation:

1. Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan

2. Toyota Central Research and Development Laboratories Inc., 41-1, Yokomichi, Nagakute, Aichi 480-1192, Japan

Abstract

Etching dynamics of urethane–urea copolymer film was investigated by utilizing nanosecond time-resolved interferometry and tuning excitation wavelength. From the behavior of fringe pattern deformation at the irradiated areas, it is considered that irradiated polymer film was decomposed more effectively with decrease in excitation wavelength. Excitation wavelength dependence of etching dynamics of urethane–urea copolymer film was not well interpreted in terms of total energy density which was stored within the polymer film due to laser irradiation, while photochemical and photothermal processes can explain mostly the results of shorter wavelength (≤ 475 nm) and longer wavelength (≥ 530 nm) excitations, respectively.

Publisher

World Scientific Pub Co Pte Lt

Subject

Physics and Astronomy (miscellaneous),Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218863504002316

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1. Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser

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