Affiliation:
1. Instituto de Física, Universidad Nacional Autónoma de México Ap. Postal 20–364 México, D.F. 01000, MEXICO
Abstract
The resolution of several methods for thin film thickness measurement using PIXE, based on the variation of the proton beam incident energy, is discussed. In order to evaluate the resolution, sputtering of copper films, deposited on aluminum and titanium substrates by argon ions is used. Sputtering yields are obtained through thickness changes, and then compared to other experimental and theoretical values. Good agreement is found, thus confirming the accuracy of PIXE as a method for film thickness determination.
Publisher
World Scientific Pub Co Pte Lt
Cited by
5 articles.
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1. Depth profiling techniques: how PIXE compares to NRP and MEIS?;X-Ray Spectrometry;2011-04-25
2. A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-08
3. PIXE depth profiling using variation of detection angle;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-08
4. Analysis by absorption and scattering of radiation;Journal of Radioanalytical and Nuclear Chemistry;1997-07
5. Low energy PIXE: advantages, drawbacks, and applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-09