Structure of Nanoparticles of Aluminum and Silicon Nitrides Produced by RF Plasma

Author:

Sato Takeshi1,Kaito Chihiro1,Saito Yoshio2

Affiliation:

1. Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-8577, Japan

2. Department of Electron and Information Science, Kyoto Institute of Technology, Kyoto 606-8585, Japan

Abstract

AlN and Si3N4 particles with sizes of the order of 50 nm were produced by passing Al and Si smoke particles of the order of 50 nm in size through a plasma field. The resulting particles showed the characteristic crystal structure of a nitride. When Al and Si particles were produced in a mixture gas of N2 and Ar without plasma, the particles produced were covered with an amorphous nitride layer composed of microcrystallites. Since the flow rate of metallic particles in the plasma region is of the order of 1 m/s, the present particles changed into nitride particles instantaneously.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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