X-RAY ANALYSIS AND MICROHARDNESS CHARACTERIZATION OF TiN/Ti MULTILAYERS

Abstract

TiN/Ti multilayers have been grown by using Hollow Cathode Discharge (HCD) ion plating and studied by x-ray diffraction analysis. Low-angle diffraction profile indicated the quasi-periodic structure. The parameters of the multilayer microstructure were obtained through x-ray double-line analysis on the high-angle profile. The results of the subgrain size D eff showed that the multilayer structure lead to grain refining. The microhardness of TiN was calculated following the idea of evaluating thin film microhardness by crystal plastic deformation. It was revealed that the multilayer microhardness could be improved by grain refining. Comparing the experimental values to the calculated data, the interface was found to be an important factor for the microhardness of TiN/Ti multiplayer film.