Silicon-based hot electron emitting substrate with double tunneling

Abstract

We propose a novel silicon structure, Hot Electron Emitting Substrate (HEES), which exhibits important effect of repeated tunneling at two different voltage ranges, which we refer to as double tunneling. In ambient atmosphere and room temperature, the [Formula: see text]–[Formula: see text] characteristic of HEES shows two current peaks during voltage sweep from 2 to 15 V. These two peaks are formed by the Fowler–Nordheim (FN) tunneling effect and tunneling diode mechanism, respectively.